Method for forming semiconductor package using carbon nano material in molding compound

ABSTRACT

Some embodiments relate to a semiconductor package. The package includes a substrate having an upper surface and a lower surface. A first chip is disposed over a first portion of the upper surface of the substrate. A second chip is disposed over a second portion of the upper surface of the substrate. A first plurality of carbon nano material pillars are disposed over an uppermost surface of the first chip, and a second plurality of carbon nano material pillars are disposed over an uppermost surface of the second chip. A molding compound is disposed above the substrate, and encapsulates the first chip, the first plurality of carbon nano material pillars, the second chip, and the second plurality of carbon nano material pillars.

REFERENCE TO RELATED APPLICATIONS

This Application is a Continuation of U.S. application Ser. No.16/222,118, filed on Dec. 17, 2018, which is a Continuation of U.S.application Ser. No. 15/823,786, filed on Nov. 28, 2017 (now U.S. Pat.No. 10,177,082, issued on Jan. 8, 2019), which is a Continuation of U.S.application Ser. No. 14/132,407, filed on Dec. 18, 2013 (now U.S. Pat.No. 9,859,199, issued on Jan. 2, 2018). The contents of theabove-referenced Patent Applications are hereby incorporated byreference in their entirety.

BACKGROUND

Poor heat dissipation is a common issue for microelectronics devicepackages. Semiconductor chips, especially those with high thermal designpower (TDP) requirements can result in localized overheating that can bedeleterious to product yield, performance and reliability of theresulting microelectronics device packages. A thermal management device,such as a heat sink, is typically placed on the backside of wafers forheat to be transported through a molding compound encapsulating asurface of the wafer to the surrounding environment. However, themolding compound, which is typically a mixture of an epoxy and a silicafiller, has a low thermal conductivity that is generally in the range of0.6 W/m-K to 0.8 W/m-K. This can make the molding compound a barrier toheat dissipation.

BRIEF DESCRIPTION OF DRAWINGS

Embodiments of the present disclosure are best understood from thefollowing detailed description when read with the accompanying figures.It is emphasized that, in accordance with the standard practice in theindustry, various features are not drawn to scale and are used forillustration purposes only. In fact, the dimensions of the variousfeatures may be arbitrarily increased or reduced for clarity ofdiscussion.

FIG. 1 is a flowchart of a method of fabricating a semiconductorpackage, according to one or more embodiments of the present disclosure.

FIGS. 2-8 are cross-sectional views of a semiconductor package atvarious stages of fabrication, according to one or more embodiments ofthe present disclosure.

FIGS. 9-11 are cross-sectional views of a semiconductor package atvarious stages of fabrication, according to one or more embodiments ofthe present disclosure.

DETAILED DESCRIPTION

In the following description, specific details are set forth to providea thorough understanding of embodiments of the present disclosure.However, one having ordinary skill in the art will recognize thatembodiments of the disclosure can be practiced without these specificdetails. In some instances, well-known structures and processes are notdescribed in detail to avoid unnecessarily obscuring embodiments of thepresent disclosure.

Reference throughout this specification to “one embodiment” or “anembodiment” means that a particular feature, structure, orcharacteristic described in connection with the embodiment is includedin at least one embodiment of the present disclosure. Thus, theappearances of the phrases “in one embodiment” or “in an embodiment” invarious places throughout this specification are not necessarily allreferring to the same embodiment. Furthermore, the particular features,structures, or characteristics may be combined in any suitable manner inone or more embodiments. It should be appreciated that the followingfigures are not drawn to scale; rather, these figures are intended forillustration.

FIG. 1 is a flowchart of a method 10 of fabricating a semiconductorpackage according to various aspects of the present disclosure.Referring to FIG. 1, the method 10 includes block 12, in which a layerof carbon nano material is grown on a chip. The chip has a first surfaceand a second surface and the layer of carbon nano material is beinggrown on the first surface of the chip. The layer of carbon nanomaterial is configured to provide a path through which heat generatedfrom the chip is dissipated. The method 10 includes block 14, in which asubstrate is attached to the second surface of the chip. The method 10includes block 16, in which a molding compound is formed above thesubstrate to encapsulate the chip and the layer of carbon nano material.

In some embodiments, additional processes are performed before, during,and/or after the blocks 12-16 shown in FIG. 1 to complete thefabrication of the semiconductor package, but these additional processesare not discussed herein in detail for the sake of brevity.

FIGS. 2-8 are cross-sectional views of portions of a semiconductorpackage at various fabrication stages according to one or moreembodiments of the present disclosure. FIGS. 2-8 have been simplifiedfor a better illustration of the concepts of the present disclosure. Itshould be appreciated that the materials, geometries, dimensions,structures, and process parameters described herein are exemplary only,and are not intended to be, and should not be construed to be, limitingto the present disclosure. Many alternatives and modifications will beapparent to those skilled in the art, once informed by the presentdisclosure.

Referring to FIG. 2, a chip 100 is provided and subjected to asingulation process. Chip 100 is a heat sensitive chip such as a memorychip, logic chip, processor chip, or the like and is affixed to a dicingtape or a die frame (not shown) where chip 100 is die cut or diced alongcutting lines to separate chip 100 into individual units 100 a.

FIG. 3 is a cross-sectional view of a portion of a semiconductor package135 at a stage of fabrication, according to one or more embodiments ofthe present disclosure. The semiconductor package 135 includes a firstsubstrate 110. In some embodiments, the first substrate 110 is a wafercarrier. First substrate 110 acts as a temporary support substrate orcarrier to facilitate wafer handling, transport, and/or processing.First substrate 110 comprises a combination of a silicon substrate, aglass substrate, a polymer substrate, a polymer-based compositesubstrate, a thick tape, or other suitable material. First substrate110, in some embodiments, is a rigid carrier configured to reduce waferwarping and/or to prevent wafer breakage that often occurs duringhandling and processing. First substrate 110 has chips 100 a attached toa surface thereto by an adhesive layer 120. In some embodiments, theadhesive layer 120 comprises one or more of an adhesive bonding, tapebonding, or other suitable material.

In FIG. 4, a catalyst or seed layer 125 is formed on an upper surface ofchips 100 a. As the name implies, the catalyst layer 125 acts as acatalyst for the formation of carbon nano materials (e.g., carbon nanofibers (CNFs) or carbon nanotubes (CNTs)) that are grown on chips 100 aand the catalyst layer 125 is arranged where this growth is desirable.However, in some embodiments as will be discussed below a catalyst orseed layer is not required for growing carbon nano material.

The catalyst in the catalyst layer 125 is synthesized by approaches suchas, for example chemical vapor deposition (CVD), physical vapordeposition (PVD), sputtering, electron beam evaporation, or a colloidalsolution process by applying a dispensing process. In some embodiments,the catalyst layer 125 includes iron (Fe), cobalt (Co), nickel (Ni),molybdenum (Mo), gold (Au), silver (Ag), palladium (Pd), platinum (Pt),copper (Cu), aluminum (Al), manganese (Mn), tin (Sn), chromium (Cr),magnesium(Mg), other suitable materials, or combinations thereof. Insome embodiments, colloidal metal(s) of one or more types, or oxideparticles having one or more particle sizes, are used as the catalystfor growing carbon nano material.

Referring now to FIG. 5, carbon nano material 140 is formed or grown onthe exposed catalyst layer 125 (not shown in FIG. 5). The carbon nanomaterial 140 is grown in a generally vertical direction away from thecatalyst layer 125. In some embodiments, the carbon nano material 140 isa carbon nano fiber (CNF) material. In some other embodiments, thecarbon nano material 140 is a carbon nanotube (CNT) material.

In some embodiments, the carbon nano material 140 is grown by a chemicalvapor deposition (CVD) process, an arc discharge process, a laserablation process, or other suitable processes. Where the carbon nanomaterial 140 is grown by a CVD method, in one or more embodiments,precursors for the CVD comprise carbon atoms. In some embodiments, thecarbon nano material 140 further comprises hydrogen atoms. In someembodiments, the precursors comprise ethane, acetylene, argon, oxygen orcombinations thereof, or other carbon-containing gases. In anotherembodiment, the precursors comprise hydrogen gas. In some embodiments,power for the CVD is between 300 and 1,500 W, the deposition temperatureof the carbon nano material 140 is between about 300 degrees Celsius andabout 450 degrees Celsius, and the deposition pressure for the carbonnano material 140 is about 0.1 Torr and about 10 Torr.

In some embodiments, the carbon nano material 140 is grown by amicrowave plasma-enhanced CVD method. In this method, a precursor gassuch as methane (in an amount about 10 sccm to about 100 sccm) isintroduced with another gas such as argon (about 2 sccm to about 50sccm) and subsequently plasma is ignited to grow carbon nano material140. The growth time for forming the carbon nano material 140 varies butin some embodiments the growth time is in the range of about 1 minute toabout 60 minutes. The working pressure is maintained at about 0.1 Torrto about 1.0 Torr with growth temperatures between about 300 degreesCelsius to about 600 degress Celsius and plasma power varied in therange of about 15 W to about 440 W.

In some embodiments, a catalyst or seed layer is not required forgrowing carbon nano material 140 on chips 100 a. In one or moreembodiments, carbon nano material 140 is grown directly on a surface ofchips 100 a by a plasma-enhanced chemical vapor deposition (PECVD)process such as DC PECVD or a microwave PECVD process and using aprecursor gas comprising CO, Ar, or O2 at a temperature of about 180degrees Celsius.

For additional information regarding carbon nano material growthapproaches such as growing carbon nanofibers and carbon nanotubes thatcan be implemented in connection with the exemplary embodiments of thepresent disclosure, reference may be made to M. S. Dresselhaus, G.Dresselhaus, and P. C. Eklund, “Science of Fullerenes and CarbonNanotubes” (Academic Press, San Diego, 1996), which is fullyincorporated herein by reference.

The carbon nano material 140 grown on chips 100 a provide a path throughwhich heat generated by chips 100 a is dissipated to the surroundingenvironment. In addition to thermal management, the carbon nano material140, in some embodiments, are also configured to provide mechanicalsupport during a molding process to minimize shrinkage and/or warping ofa molding compound supplied during the molding process. In one or moreembodiments, the carbon nano material 140 are capable of being used inintegrated circuit packaging type or technology, including, but notlimited to, wired bonded packages, flip chip molded matrix arraypackages (FCMMAP), and other packages that couple an integrated circuitdie to second level interconnects such as a ball grid array, a land gridarray, and/or a pin grid array.

In accordance with various embodiments of the present disclosure, thecarbon nano material 140 has a thermal conductivity that is high enoughto provide sufficient passive cooling for the integrated circuitpackage. For instance, in some embodiments of the present disclosure,the carbon nano material 140 has a thermal conductivity between about 3W/m-K and about 10 W/m-K. In some embodiments, depending on the specificmaterials used in the carbon nano material 140, the thermal conductivityof the carbon nano material 140 is higher than 10 W/m-K. In someembodiments, depending on chip size, chip spacing and the technologyemployed, the thickness of the carbon nano material 140 ranges fromabout 0.5 microns to about 300 microns.

A molding compound 150 is then formed over first substrate 110 andencapsulates the carbon nano material 140, first chips 100 a, and/orcatalyst layer 125. The molding compound 150 is configured to providepackage stiffness, a protective or hermetic cover, shielding, and/orprovide a heat conductive path to prevent chip overheating. Moldingcompound 150 comprises any material such as epoxy, epoxy with thermallyconductive filler materials, organic cylinders, plastic moldingcompound, plastic molding compound with fiber, or other suitablematerial. In some embodiments, the molding compound 150 is formed by aspin-on coating process, an injection molding process, and/or othersuitable process.

FIG. 6 is a cross sectional view of the semiconductor package 135, afterthe molding compound 150 is formed on first substrate 110, and themolding compound 150 is planarized, in accordance with one or moreembodiments. In some embodiments, the molding compound 150 is planarizedby a chemical mechanical polishing (CMP) process, for example.Mechanical grinding processes such as CMP sometimes cause damage to thesemiconductor package 135. Accordingly, in some embodiments, a methodless likely to cause damage such as, for example, wet chemical etching,dry chemical etching, dry polishing, plasma etching, or other suitableetching process is used to planarize the molding compound 150.

FIG. 7 is a cross-sectional view of the semiconductor package 135 in aninverted position, having been flipped following a planarizationprocess, in accordance with one or more embodiments. The semiconductorpackage 135 is released from the first substrate 110 and the chip sideof the semiconductor package 135 is bonded to a package substrate 160.In other embodiments, the first substrate 110 remains attached to thesemiconductor package 135 to become the package substrate 160. In someembodiments, package substrate 160 has formed therein any of severaladditional microelectronic layers such as RDLs (redistribution layers)(not shown) and microelectronic materials such as conductor materials,semiconductor materials, and dielectric materials. In some embodiments,package substrate 160 also includes active and passive devices (notshown).

FIG. 8 is a cross-sectional view of the semiconductor package 135mounted onto a board 180, such as a printed circuit board (PCB) byelectrical connectors 170, such as ball grid array (BGA). In someembodiments, the electrical connectors 170 comprise lead free solder orother suitable electrical connection material. A thermal interfacematerial (TIM) 190 is dispensed on top of the molding compound 150, thecarbon nano material 140 and chips 100 a. In some embodiment, TIM 190comprises a thermally conductive and electrically insulative material,such as an epoxy, like an epoxy mixed with a metal like silver or gold,a “thermal grease,” a “white grease,” other suitable material, or acombination thereof. In some embodiments, a thermal management device200 such as a heat sink is placed on the TIM 190 to facilitate thedissipation of heat from chips 100 a.

FIGS. 9-11 are cross-sectional views of a semiconductor package atvarious stages of fabrication, according to one or more embodiments ofthe present disclosure. FIGS. 9-11 have been simplified for a betterillustration of the concepts of the present disclosure. It should beappreciated that the materials, geometries, dimensions, structures, andprocess parameters described herein are exemplary only, and are notintended to be, and should not be construed to be, limiting to thepresent disclosure. Many alternatives and modifications will be apparentto those skilled in the art, once informed by the present disclosure.

Referring to FIG. 9, a metal layer 130 is deposited on a surface of achip 100. Chip 100 is a heat sensitive chip such as a memory chip, logicchip, processor chip, or the like. The metal layer 130 comprises aconductive material such as, for example iron (Fe), cobalt (Co), nickel(Ni), molybdenum (Mo), gold (Au), silver (Ag), palladium (Pd), platinum(Pt), copper (Cu), aluminum (Al), manganese (Mn), tin (Sn), chromium(Cr), magnesium(Mg), or alloys thereof and is deposited to a thin layerby an E-beam evaporation process, a sputter process, or the like. Insome embodiments, the metal layer 130 has a thickness from about 10Angstroms to about 1,000 Angstroms.

Chip 100 is subjected to a singulation process whereby it is affixed toa dicing tape or a die frame (not shown) and chip 100 is die cut ordiced along cutting lines to separate chip 100 into individual units 100a.

FIG. 10 is a cross-sectional view of a portion of a semiconductorpackage 135 at a stage of fabrication, according to one or moreembodiments of the present disclosure. The semiconductor package 135includes a first substrate 110. In some embodiments, the first substrate110 is a wafer carrier. First substrate 110 acts as a temporary supportsubstrate or carrier to facilitate wafer handling, transport, and/orprocessing. First substrate 110 comprises a combination of a siliconsubstrate, a glass substrate, a polymer substrate, a polymer-basedcomposite substrate, a thick tape, or other suitable material. Firstsubstrate 110, in some embodiments, is a rigid carrier configured toreduce wafer warping and/or to prevent wafer breakage that often occursduring handling and processing. First substrate 110 has chips 100 a andmetal layers 130 attached to a surface thereto by an adhesive layer 120.In some embodiments, the adhesive layer 120 comprises one or more of anadhesive bonding, tape bonding, or other suitable material.

In FIG. 11, semiconductor package 135 is subjected to a thermal annealprocess to convert the metal layers 130 into catalyst layers 125 thatcomprise of metal nano particles. The catalyst layer 125 is used to forma layer of carbon nano material such as, for example carbon nano fibers(CNFs) and carbon nanotubes (CNTs) that are grown on chips 100 a and thecatalyst layer 125 is arranged where this growth is desirable. Accordingto one or more embodiments, the layer of carbon nano material is grownfrom the catalyst layers 125 when the semiconductor package 135 isheated to a temperature between about 300 degrees Celsius and about1,000 degress Celsius for a time period of about 10 minutes to about 600minutes.

Additional processes such as the formation of the layer of carbon nanomaterial (e.g., CNFs and CNTs) on the exposed catalyst layer 125 andtheir implementation in the semiconductor package 135 are the same asthe process steps described in FIGS. 5-8 and therefore will not berepeated again.

In one or more embodiments, the layer of carbon nano material, such ascarbon nanotubes or carbon nano fibers in a semiconductor packageprovides a high degree of heat dissipation by providing a thermal paththrough which thermal energy, or heat that is generated by a chip isdissipated to the ambient or environment.

In one or more embodiments, use of carbon nano material, such as carbonnanotubes or carbon nano fibers in a semiconductor package allows heatgenerated by temperature sensitive chips to be effectively and/orefficiently dissipated to the ambient or to a thermal management deviceto prevent overheating of the chip.

In one or more embodiments, use of carbon nano material, such as carbonnanotubes or carbon nano fibers in a semiconductor package providesmechanical support during molding to minimize molding compound shrinkageand/or warpage.

Various aspects of the present disclosure have been described. Accordingto one aspect of this description, a method of forming a semiconductorpackage includes growing a layer of carbon nano material on a chip. Thechip has a first surface and a second surface and the layer of carbonnano material is grown on the first surface of the chip. The layer ofcarbon nano material is configured to provide a path through which heatgenerated from the chip is dissipated. A substrate is attached to thesecond surface of the chip. A molding compound is formed above thesubstrate to encapsulate the chip and the layer of carbon nano material.

According to another aspect of this description, a method for forming asemiconductor device includes growing a seed layer on a first surface ofa chip. A layer of carbon nano material is grown on the seed layer. Thelayer of carbon nano material is configured to provide a path throughwhich heat generated from the chip is dissipated. A substrate isattached to a second surface of the chip. A molding compound is formedabove the substrate to encapsulate the chip, the seed layer, and thelayer of carbon nano material.

According to yet another aspect of this description, a semiconductorpackage includes a chip attached to a first substrate. A layer of carbonnano material is attached to a surface of the chip, wherein the layer ofcarbon nano material is configured to provide a path through which heatgenerated from the chip is dissipated. A molding compound is formedabove the first substrate, the molding compound encapsulating the chipand the layer of carbon nano material.

In the preceding detailed description, various embodiments have beendescribed. It will, however, be apparent to a person of ordinary skillin the art that various modifications, structures, processes, andchanges may be made thereto without departing from the broader spiritand scope of the present disclosure. The specification and drawings are,accordingly, to be regarded as illustrative and not restrictive. It isunderstood that embodiments of the present disclosure are capable ofusing various other combinations and environments and are capable ofchanges or modifications within the scope of the claims and their rangeof equivalents.

What is claimed is:
 1. A semiconductor package, comprising: a substratehaving an upper surface and a lower surface; a first chip attached to afirst portion of the upper surface of the substrate; a molding compounddisposed above the substrate, the molding compound encapsulating thefirst chip; a heat sink having a lowermost surface disposed over anuppermost surface of the molding compound; and a layer of carbon nanomaterial encapsulated by the molding compound, and having an uppermostsurface that resides below the lowermost surface of the heat sink. 2.The semiconductor package of claim 1, wherein the layer of carbon nanomaterial comprises: a plurality of carbon nano material pillarsencapsulated by the molding compound, the plurality of carbon nanomaterial pillars having respective uppermost surfaces that reside belowthe lowermost surface of the heat sink.
 3. The semiconductor package ofclaim 1, wherein the lowermost surface of the heat sink is in parallelwith an upper surface of the first chip.
 4. The semiconductor package ofclaim 3, wherein the lowermost surface of the heat sink and the uppersurface of the first chip are each flat, level, and/or planar.
 5. Thesemiconductor package of claim 1, wherein the layer of carbon nanomaterial comprises: a plurality of carbon nano material pillarsencapsulated by the molding compound, wherein an outermost edge of theplurality of carbon nano material pillars resides directly over a faceof the first chip and does not extend beyond an outer sidewall of thefirst chip.
 6. The semiconductor package of claim 1, wherein the layerof carbon nano material comprises: a plurality of carbon nano materialpillars encapsulated by the molding compound, wherein the plurality ofcarbon nano material pillars are arranged in parallel with one anotherand are elongated in a first direction, the first direction beingperpendicular to a lowermost surface of the heat sink.
 7. Thesemiconductor package of claim 1, wherein the layer of carbon nanomaterial includes a catalyst layer for growing the layer of carbon nanomaterial.
 8. A semiconductor package, comprising: a substrate having anupper surface and a lower surface; a first chip attached to a firstportion of the upper surface of the substrate; a molding compounddisposed above the substrate, the molding compound encapsulating thefirst chip; a heat sink having a lowermost surface disposed over anuppermost surface of the molding compound; and a plurality of carbonnano material pillars encapsulated by the molding compound, wherein anoutermost edge of the plurality of carbon nano material pillars residesdirectly over a face of the first chip and does not extend beyond anouter sidewall of the first chip.
 9. The semiconductor package of claim8, further comprising: a second chip over a second portion of the uppersurface of the substrate; and a second plurality of carbon nano materialpillars over an uppermost surface of the second chip.
 10. Thesemiconductor package of claim 9: wherein an outermost edge of thesecond plurality of carbon nano material pillars resides directly over aface of the second chip and does not extend beyond an outer sidewall ofthe second chip.
 11. The semiconductor package of claim 8, wherein theplurality of carbon nano material pillars include a catalyst layer forgrowing the plurality of carbon nano material pillars.
 12. Thesemiconductor package of claim 8, further comprising: a second substrateattached to the substrate by one or more of a ball grid array, a landgrid array, or a pin grid array.
 13. The semiconductor package of claim8, wherein the plurality of carbon nano material pillars have athickness ranging from about 0.5 microns to about 300 microns.
 14. Thesemiconductor package of claim 8, further comprising: an adhesive tapedisposed directly on an upper surface of the substrate and affixing thefirst chip to the upper surface of the substrate.
 15. The semiconductorpackage of claim 8, wherein plurality of carbon nano material pillarshave a thermal conductivity between about 3 Watts/meter*Kelvin (W/m*K)and about 10 W/m*K.
 16. A semiconductor package, comprising: a substratehaving an upper surface and a lower surface; a first chip attached to afirst portion of the upper surface of the substrate; a molding compounddisposed above the substrate, the molding compound encapsulating thefirst chip; a heat sink having a lowermost surface disposed over anuppermost surface of the molding compound; and a plurality of carbonnano material pillars encapsulated by the molding compound, wherein theplurality of carbon nano material pillars are arranged in parallel withone another and are elongated in a first direction, the first directionbeing perpendicular to a lowermost surface of the heat sink to transferheat from the first chip to the heat sink.
 17. The semiconductor packageof claim 16, wherein the molding compound encapsulates the first chipand extends over upper surfaces of the plurality of carbon nano materialpillars and separates a first pillar of the plurality of carbon nanomaterial pillars from a second pillar of the plurality of carbon nanomaterial pillars.
 18. The semiconductor package of claim 16, wherein anoutermost edge of the plurality of carbon nano material pillars residesdirectly over a face of the first chip and does not extend beyond anouter sidewall of the first chip.
 19. The semiconductor package of claim16, wherein the plurality of carbon nano material pillars haverespective uppermost surfaces that reside below the lowermost surface ofthe heat sink.
 20. The semiconductor package of claim 16, furthercomprising: a second chip over a second portion of the upper surface ofthe substrate; and a second plurality of carbon nano material pillarsover an uppermost surface of the second chip.